45 nanometer
| Last modified: Friday, February 22, 2008
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45 nanometer (45 nm) is the buzzword of choice (2007-2008) for an
advanced semiconductor manufacturing process that
Intel used for mass chip
production, starting in late 2007. The 45 nanometer manufacturing process uses new
materials, including hafnium-based high-k gate dielectrics and metal gates, to
reduce electrical current leakage in transistors. Contrast with
90 nanometer.
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 Introducing the 45nm Next-Generation Intel Core Micro architecture (PDF)
Intel's January 2007 demonstration of the world's first 45nm Hi-k processor underscored its process technology lead of more than two years over the rest of the semiconductor industry.
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